Spatial resolution limits in electron-beam-induced deposition
نویسندگان
چکیده
منابع مشابه
Spatial resolution limits in electron-beam-induced deposition
Electron-beam-induced deposition EBID is a versatile microand nanofabrication technique based on electron-induced dissociation of metal-carrying gas molecules adsorbed on a target. EBID has the advantage of direct deposition of three-dimensional structures on almost any target geometry. This technique has occasionally been used in focused electron-beam instruments, such as scanning electron mic...
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Electron-beam-induced-deposition (EBID) is a versatile direct writing technique occasionally used in microand nanofabrication. We focus in our study on the EBID spatial resolution, defined as the lateral size of the smallest deposited structure. The lateral size of dot structures always exceeds the diameter of the electron probe. Many authors have argued that this is due to the secondary electr...
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2005
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.2085307